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==Gas Discharge Ion Source (GDIS)== A Gas Discharge Ion Beam Source (GDIS) is developed as an example of a low energy ion beam source. Ion beam diagnostics like beam emittance measurement and mass analysis are done to investigate optimum parameters in producing mixed species hydrogen positive ions. By producing a low energy ion beam (H+ and H2+), this source is tested for surface modification applications such as ion beam irradiation on sample polymers. The effects on structural organic polymers such as wood, polytetrafluoroethylene, polyethylene, cellulose materials and others are tried. The ion treatment that the sample surfaces undergo changes their physicochemical properties. The modification is of great significance in the moisture absorption of the material improving its characteristic features like dyeability, anti stain, and other physical characteristics. Present results can be extended to applications on other polymers, bio-organisms and semiconductors. Other gas ions like oxygen, helium and nitrogen are to be irradiated on similar polymers. Group Leaders: *Hernando Siy Salapare, III, PhD Physics student
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